Co-organized by EUV Litho, Inc., MIT Lincoln Laboratory and CH3IP Consortium, 2025 EUVL and Source Workshop is a unique annual forum to discuss the challenge and progress of EUVL as it is being implemented in the state-of-the-art semiconductor manufacturing and emerging new directions, which would enable semiconductor manufacturing to the end of this decade and well into the 2030s. Please note that this year annual EUVL Workshop and Source Workshop are being held together in June 2025. 

This page is for registration for 2025 EUVL and Source Workshop (Welcome reception on June 23rd evening, all day meetings from June 24 - June 26, 2025). The registration for the workshop will close on May 23, 2025.

For registration for on-line short courses on June 21 - 22, 2025, please visit our home page. Blue-X TWG meeting, held on June 23 (9 AM - 5 PM), is open to Blue-X TWG members only, and is not included in this registration. 

Additional information regarding workshop agenda, presenters, etc., is available on our website, www.euvlitho.com.

If you have any questions or concerns, please direct them to Administrative team at [email protected].

  • Registration for all attendees and speakers.

  • Registration for registered full-time students only.

  • Company logo will be displayed in the Proceedings, on a shared recognition during workshop, and on our website. One complimentary registration for Source Workshop.

  • Company logo will be displayed in the Proceedings, on a full slide recognition during workshop, and on online in marketing posts. Two complimentary registrations for Source Workshop.

  • Company logo will be displayed in the Proceedings, on a full slide recognition during workshop, and in any online marketing & paid advertisements we run. Three complimentary registrations for Source Workshop.

For individuals who are neither a US citizen nor a US green card holder, please fill out the following information.   

  • US citizens and green card holders do not need to complete this section
  • This information is necessary in order to enable access the MIT Lincoln Laboratory venue  
  • For additional questions, please write to [email protected]



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