Co-organized by EUV Litho, Inc., ARCNL and CH3IP Consortium, the annual Source Workshop focuses on the latest scientific and technical developments related to extreme ultraviolet (EUV) and soft X-ray sources and provides a forum for researchers and end-users in this area to present their work and discuss a wide range of potential applications.
Additional information regarding workshop agenda, presenters, etc., is available on our website, www.euvlitho.com.
If you have any outlying questions or concerns, please direct them to Administrative team at [email protected].
Registration for all attendees and speakers.
Registration for registered full-time students only.
Company logo will be displayed in the Proceedings, on a shared recognition during workshop, and on our website. One complimentary registration for Source Workshop.
Company logo will be displayed in the Proceedings, on a full slide recognition during workshop, and on online in marketing posts. Two complimentary registrations for Source Workshop.
Company logo will be displayed in the Proceedings, on a full slide recognition during workshop, and in any online marketing & paid advertisements we run. Three complimentary registrations for Source Workshop.
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